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VO2-Based Infrared Microbolometer Array

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Abstract

V02-based thin film materials on silicon substrates are fabricated by ion beam sputtering and a post-annealing which is different from the conventional fabricating method. An infrared linear microbolometer array with 128 pixels is prepared using as-deposited vanadium dioxide thin films. Optical and electrical properties for V02-based microbolometer array are tested.

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Authors and Affiliations

  1. Deparment of Optoelectronic Engineering, Huazhong University of Science & Technology, Wuhan, 430074, China

    Xinjian Yi & Sihai Chen

  2. Aerospace Group of Science & Technology, 25th Research Institute, Beijing, 100854, China

    Yingrui Wang

  3. State Key Laboratory for Imaging Recognition & Intelligence Control, Huazhong University of Science & Technology, Wuhan, 430074, China

    Bifeng Xiong & Hongchen Wang

Authors
  1. Xinjian Yi
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  2. Sihai Chen
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  3. Yingrui Wang
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  4. Bifeng Xiong
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  5. Hongchen Wang
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Yi, X., Chen, S., Wang, Y. et al. VO2-Based Infrared Microbolometer Array. International Journal of Infrared and Millimeter Waves 23, 1699–1704 (2002). https://doi.org/10.1023/A:1021450317818

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  • DOI: https://doi.org/10.1023/A:1021450317818

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