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Semiconductor Fatigue-Damage Indicator

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Journal of Engineering Physics and Thermophysics Aims and scope

Abstract

A means of using a semiconductor film element as a fatigue-damage indicator is substantiated. Methods of manufacturing it are described.

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REFERENCES

  1. O. Z. Galkina and V. P. Bulycheva, in: Proc. Seminar-Meeting "Electrotensometry" [in Russian], Leningrad (1975), pp. 26–28.

  2. D. A. Gritsenko, Yu. A. Denisov, G. I. Danilov, and V. A. Pokrytov, Zavod. Lab., No. 3, 319–321 (1975).

    Google Scholar 

  3. R. A. Makarov (ed.), Tensometry in Machine Building: Handbook [in Russian], Moscow (1975).

  4. A. N. Arkhipov, A. G. Zhdan, M. A. Messerer, et al., Fiz. Tekh. Poluprovodn., 8, Issue 5, 1030 (1974).

    Google Scholar 

  5. É. A. Abdullaev, T. Azimov, M. M. Akhmedov, et al., in: Physical Principles of Semiconductor Tensometry [in Russian], Interuniversity Collection of Sci. Papers, Novosibirsk (1981), p. 165.

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Karabaev, M.K., Onarkulov, K.É., Akhmedov, M.M. et al. Semiconductor Fatigue-Damage Indicator. Journal of Engineering Physics and Thermophysics 75, 1227–1228 (2002). https://doi.org/10.1023/A:1021148515440

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  • DOI: https://doi.org/10.1023/A:1021148515440

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