Abstract
We benchmark macroscopic transport models against the ballistic limit in a realistic MOSFET structure to assess their validity in the near-ballistic regime and identify the challenges to a new macroscopic model valid from diffusive to ballistic limit. The macroscopic transport models tested in this study are drift-diffusion, Bude's drift-diffusion, and an energy transport model. We perform the benchmarking study with quasi-2D simulation on a model 10 nm ultra-thin body double-gate MOSFET. We confirm from our results that none of those macroscopic models successfully provides reliable predictions for nanotransistors operating in the near-ballistic regime and we explain the reason for the failure.
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Rhew, JH., Ren, Z. & Lundstrom, M.S. Benchmarking Macroscopic Transport Models for Nanotransistor TCAD. Journal of Computational Electronics 1, 385–388 (2002). https://doi.org/10.1023/A:1020712010848
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DOI: https://doi.org/10.1023/A:1020712010848