Abstract
The coupling of a quadrupole mass spectrometer (QMS) via a heated capillary to a commercial thermogravimetric analyser is described. The amu and temperature ranges available were up to 1000 amu and 1500°C, respectively. The system was evaluated with test compounds, yielding gaseous species in the m/z range of 17-80, and then used for the study of thermal behaviour of scandium dipivaloyl methanate or Sc(thd)3 which is discussed in detail. Sc(thd)2 appears as the major Sc-containing species with m/z=411 in the gas phase at 200-300°C.
Similar content being viewed by others
References
W. R. Holdiness, Thermochim. Acta, 75 (1984) 361.
D. Dollimore, G. A. Gamlen and T. J. Taylor, Thermochim. Acta, 75 (1984) 59.
E. Kaisersberger and E. Post, Thermochim. Acta, 295 (1997) 73.
J. P. Redfern, Polymer Intl., 26 (1991) 51.
H. G. Langer, In: I. M. Kolthoff and P. J. Elving (Eds.), Treatise on Analytical Chemistry, Vol. 12., Interscience, New York 1982, p. 229.
E. Kaisersberger and W.-D. Emmerich, Thermochim. Acta, 85 (1985) 275.
T. Leskelä, M. Lippmaa, L. Niinistö and P. Soininen, Thermochim. Acta, 214 (1993) 9.
A. R. McGhie, Thermochim. Acta, 234 (1994) 21.
E. Clarke, Thermochim. Acta, 51 (1981) 7.
T. Arii and Y. Masuda, Thermochim. Acta, 342 (1999) 139.
M. Tiitta and L. Niinistö, Chem. Vap. Deposition, 3 (1997) 167.
G. V. Girichev, N. I. Giricheva, N. V. Belova, A. R. Kaul‘, N. P. Kuz’mina and Yu. Gorbenko, Russ. J. Inorg. Chem. (Engl. transl.), 38 (1993) 320.
M. Leskelä, R. Sillanpää, L. Niinistö and M. Tiitta, Acta Chem. Scand., 45 (1991) 1006.
T. Leskelä, K. Vasama, G. Härkönen, P. Sarkio and M. Lounasmaa, Adv. Mater. Opt. Electron., 6 (1996) 169.
C. Hirayama, R. G. Charles, R. D. Straw and P. G. Sullivan, Thermochim. Acta, 88 (1985) 407.
T. Suntola, In: D. A. Glocker (Ed.), Handbook of thin film process technology, IOP Publishing Ltd., London 1995, p. B1.5:1.
L. Niinistö, Proc. Int. Semicond. Conf. CAS, 1 (2000) 33.
M. Putkonen, M. Nieminen, J. Niinistö and L. Niinistö, Chem. Mater, 3 (2001) 4701.
K. A. Fleeting, H. O. Davies, A. C. Jones, P. O'Brien, T. J. Leedham, M. J. Crosbie, P. J. Wright and D. J. Williams, Chem. Vap. Deposition, 5 (1999) 261.
M. Ritala, M. Juppo, K. Kukli, A. Rahtu and M. Leskelä, J. Phys. IV France, 9 (1999) 1021.
M. Juppo, A. Rahtu, M. Ritala and M. Leskelä, Langmuir, 16 (2000) 4034.
K. J. Eisentraut and R. E. Sievers, J. Inorg. Nucl. Chem., 29 (1967) 1931.
http://webbook.nist.gov/chemistry, 24.7.2001.
C. Dücsö, N. Q. Khanh, Z. Horváth, I. Bársony, M. Utriainen, S. Lehto, M. Nieminen and L. Niinistö, J. Electrochem. Soc., 143 (1996) 683.
M. Utriainen, S. Lehto, L. Niinistö, C. Dücsö, N. Q. Khanh, Z. Horváth, I. Bársony and B. Pécz, Thin Solid Films, 297 (1997) 39.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Mészáros-Szécsényi, K., Päiväsaari, J., Putkonen, M. et al. Scandium dipivaloyl methanate as a volatile precursor for thin film deposition. Journal of Thermal Analysis and Calorimetry 69, 65–75 (2002). https://doi.org/10.1023/A:1019929521641
Issue Date:
DOI: https://doi.org/10.1023/A:1019929521641