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On the oxidation–reduction kinetics of palladium

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Abstract

The oxidation–reduction kinetics of Pd was investigated on polycrystalline Pd foils using XPS and sputter‐depth profiling over a wide range of temperatures. The observed behavior can be explained in terms of a desorption‐controlled process at lower temperatures (T > 230° C) and a diffusion‐controlled process at higher temperatures (T > 450° C). In the intermediate range (230 < T < 450°C) a transition between the two processes is observed which gives rise to a pronounced shoulder in the reduction time trace. The interpretation is qualitatively confirmed using a simple mathematical model for a coupled bulk diffusion/surface reaction system.

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Authors and Affiliations

  1. Institut für Chemische Verfahrenstechnik, Universität Stuttgart, Stuttgart, Germany

    G. Veser

  2. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN, USA

    G. Veser & R. Caretta

  3. Surface Analysis Center, University of Minnesota, Minneapolis, MN, USA

    A. Wright & R. Caretta

Authors
  1. G. Veser
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  2. A. Wright
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  3. R. Caretta
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Veser, G., Wright, A. & Caretta, R. On the oxidation–reduction kinetics of palladium. Catalysis Letters 58, 199–206 (1999). https://doi.org/10.1023/A:1019050522282

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