Abstract
The effect of trace amounts of NaCl vapor on thehigh-temperature oxidation of TiAl was examined bythermogravimetry and analysis of the scale formed onTiAl. The mass gain due to oxidation at 1273 K in O2 with trace amounts of NaCl vaporwas far lower than that in pure O2 withoutNaCl vapor. This low mass gain in the atmosphere withtrace amounts of NaCl vapor resulted from the saturationbehavior of mass gain during the initial period ofoxidation. It was found from X-ray photoemissionspectroscopy (XPS) analyses of the specimen surface thatthe oxide film formed during the initial period in theatmosphere with trace amounts of NaCl vapor consisted ofdense Al2O3, thus, the lowoxidation rate of TiAl was attributed to a protectiveoxide film of denseAl2O3.
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Hara, M., Kitagawa, Y. Effect of Trace Amounts of NaCl Vapor on High-Temperature Oxidation of TiAl. Oxidation of Metals 52, 77–94 (1999). https://doi.org/10.1023/A:1018823007468
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DOI: https://doi.org/10.1023/A:1018823007468