Preparation of textured Mg₂TiO₄ thin filmson Si substrate by atmospheric pressure metallorganic chemical vapour deposition

Abstract

Highly crystalline and fully [1 0 0]-textured Mg₂TiO₄ thin films have been successfully prepared on Si(1 0 0) and (1 1 1) substrate by using atmospheric pressure metallorganic chemical vapour deposition. Magnesium acetylacetonate was used as the metallorganic source. The films were produced in a horizontal warm-wall reactor. X-ray diffraction experiments provided evidence that the Mg₂TiO₄ thin films on Si substrate were fully textured with [1 0 0] orientation perpendicular to the substrate surface. The films obtained a very smooth and densely packed surface morphology. The relationship between substrate temperature and crystallographic orientations was also considered.