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Chemical and mechanical polishing effects on capacitance-voltage curve recovery of MOS capacitors passivated with AlF3-GeO2-B2O3 glasses exposed to water vapour

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Journal of Materials Science Letters

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  1. Toshiba ULSI Research Centre, 1-Komukai, Toshibacho, Kawasaki, Japan

    K. KOBAYASHI

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  1. K. KOBAYASHI
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KOBAYASHI , K. Chemical and mechanical polishing effects on capacitance-voltage curve recovery of MOS capacitors passivated with AlF3-GeO2-B2O3 glasses exposed to water vapour. Journal of Materials Science Letters 16, 1718–1720 (1997). https://doi.org/10.1023/A:1018507021453

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