Abstract
The influence of O3 on the passive behaviour of copper was analysed in the potential region −0.32 to 0.70V vs RHE in borax solutions (pH9.2) through voltammetric techniques and ellipsometry. Oxide formation can be explained as a sequence of Cu2O growth, Cu(ii) chemisorption, and dissolution precipitation steps similar to those corresponding to copper electrodes in deaerated solutions. The role of Cu(ii) chemisorption is discussed in this paper. The progressive accumulation of hydrated layers hinders the reaction between O3 and the metal. O2 and O3 promote growth and dissolution processes (both at open circuit and in controlled potential experiments) but O3 has a stronger effect.
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MELE , M.F.L.D., VIERA , M.R. & ZERBINO , J.O. Electrochemical and ellipsometric study of the oxide films formed on copper in borax solution: Part II: Effect of ozone. Journal of Applied Electrochemistry 27, 396–403 (1997). https://doi.org/10.1023/A:1018405519170
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DOI: https://doi.org/10.1023/A:1018405519170