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Growth of Fe4N thin films by atmospheric pressure vapor phase epitaxy

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Science and Technology, Faculty of Engineering, Shizuoka University, 3–5–1 Johoku, Hamamatus, Shizuoka, 432-8561, Japan

    N. Tamura, N. Takahashi & T. Nakamura

  2. Group I, Development, Development, Suzuki Motor Corporation, Hamamatsu-Nishi, Hamamatsu, Shizuoka, 432–8611, Japan

    T. Takahashi

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  1. N. Tamura
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  2. N. Takahashi
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  3. T. Nakamura
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  4. T. Takahashi
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Tamura, N., Takahashi, N., Nakamura, T. et al. Growth of Fe4N thin films by atmospheric pressure vapor phase epitaxy. Journal of Materials Science Letters 21, 321–323 (2002). https://doi.org/10.1023/A:1017996426142

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