Abstract
The kinetics of electroless silver deposition from solutions containing Co(II)-ammonia complex compounds as reducing agents was studied at 20 and 50 °C. The process rate depends on the solution pH and the concentration of Ag(I), Co(II) and ammonia species. Under optimum operating conditions selected a silver deposition rate up to 1.2 μm h−1 can be obtained at 20 °C with high solution stability. At elevated temperature (50 °C) the rate increases and reaches ∼3 μm h−1. The silver coatings obtained are of high quality, compact and bright.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
A. Vaškelis, in D. Satas (Ed.), 'Coatings Technology Handbook' (Marcel Dekker, New York, 1991), p. 187.
A. Vaškelis and M. Šalkauskas, in D. Satas (Ed.), 'Plastics Finishing and Decorations' (Van Nostrand Reinhold Co., New York, 1986), p. 287.
G.O. Mallory and J.B. Hajdu (Eds), 'Electroless Plating: Fundamentals and Applications' (American Electroplaters and Surface Finishers Society, Orlando, 1990), p. 539.
M. Šalkauskas and A. Vaškelis, 'Chemical Metallizing of Plastics' (Khymia, Leningrad, 1985), p. 144 (in Russian).
F. Pearlstein and R.F. Weightman, Plating 58 (1971) 1014; ibid. 61 (1974) 154.
A. Vaškelis and O. Diemontaitė, Trans. Lithuanian Acad. Sci. B4(89) (1975) 23; B5(96) (1976) 3.
N. Koura and A. Kubota, J. Met. Finish. Soc. Jpn. 36 (1985) 182.
A. Vaškelis and O. Diemontaitė, Trans. Lithuanian Acad. Sci. B1(116) (1980) 3.
A. Vaškelis, A. Jagminienė, R. Juškėnas, E. Matulionis and E. Norkus, Surf. Coat. Technol. 82 (1996) 165.
A. Vaškelis and A. Jagminienė, Zashchita Metallov (Moscow) 25 (1989) 305.
A. Vaškelis, E. Norkus, G. Rozovskis and J. Vinkevičius, Trans. Inst. Metal Finish. 75 (1997) 1.
A. Vaškelis and E. Norkus, Electrochim. Acta 44 (1999) 3667.
E. Norkus, Talanta 47 (1998) 1297.
A. Vaškelis and O. Diemontaitė, Trans. Lithuanian Acad. Sci. B5 (1978) 13.
R.D. Jones, D.A. Summerville and F. Basolo, Chem. Revs. 79 (1979) 139.
E.C. Niederhoffer, J.H. Timmons and A.E. Martell, Chem. Revs. 84 (1984) 137.
D.M. Palade, Koord. Khim. 18 (1992) 729.
E. Norkus, A. Vaškelis, A. Grigucevičienė, G. Rozovskis, J. Reklaitis and P. Norkus, Transition Metal Chem. 26 (2001) 465–472.
M. Mori, J.A. Weil and M. Ishiguro, J. Am. Chem. Soc. 90 (1968) 615.
J. Simplicio and R.G. Wilkins, J. Am. Chem. Soc. 91 (1969) 1325.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Norkus, E., Vaškelis, A., Jagminienė, A. et al. Kinetics of electroless silver deposition using cobalt(II)-ammonia complex compounds as reducing agents. Journal of Applied Electrochemistry 31, 1061–1066 (2001). https://doi.org/10.1023/A:1017983025030
Issue Date:
DOI: https://doi.org/10.1023/A:1017983025030