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Electrodeposition of La–Ni alloy films in a nonaqueous system

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Abstract

The codeposition of La–Ni alloy films in a nonaqueous system was investigated. The effects of several factors including the concentrations of main salts, pH, temperature, current density and substrates on the lanthanum content in the deposit were studied. The results show that the lanthanum content in the deposit can reach 18 wt% by controlling the system composition and deposition conditions. X-ray photoelectron spectrometry, X-ray diffraction and scanning electron microscope were used to characterize the morphology and structure of the deposit. The results show that the majority of lanthanum exists in the form of LaH2, while the rest exists as metal and its oxide in the deposit, and the structure of the alloy deposited is amorphous.

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Authors and Affiliations

  1. Department of Applied Chemistry, Harbin Institute of Technology, Harbin, People's Republic of China

    M.Z. An, J.L. Wang & D.Z. Sun

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  1. M.Z. An
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  2. J.L. Wang
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  3. D.Z. Sun
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An, M., Wang, J. & Sun, D. Electrodeposition of La–Ni alloy films in a nonaqueous system. Journal of Applied Electrochemistry 31, 891–896 (2001). https://doi.org/10.1023/A:1017577804078

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  • DOI: https://doi.org/10.1023/A:1017577804078

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