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Nanoscale Surface Roughness Contribution to the Kapitza Resistance Between Superfluid He and Silicon

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Abstract

Measurements of the Kapitza resistance have been made on single Si(001) crystals at T > 1.5 K. The surface morphology of the samples was characterised by Atomic Force Microscopy (AFM). The results, interpreted using the Adamenko and Fuks (AF) model, demonstrate that nanometre-scale roughness produces diffuse and/or resonant phonon scattering. This explains the discrepancy between the measured Kapitza resistance and the Khalatnikov values.

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  1. LIMSI-CNRS, B.P. 133, F-91403, Orsay, France

    J. Amrit & M. X. François

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  1. J. Amrit
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  2. M. X. François
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Amrit, J., François, M.X. Nanoscale Surface Roughness Contribution to the Kapitza Resistance Between Superfluid He and Silicon. Journal of Low Temperature Physics 128, 113–121 (2002). https://doi.org/10.1023/A:1016341826786

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