Abstract
Electroless copper deposition using Co(II)-ethylenediamine (En) complexes as reducing agents was investigated in 0.4–1.2 M En solutions at 50 and 70 °C. There is a complicated dependence of the process rate on pH, En concentration and temperature. A copper deposition rate up to 6 μm h−1 (50–70 °C) in relatively stable solutions (pH ∼ 6) can be achieved. The stoichiometry of the Cu(II) reduction at pH 6–7 corresponds to the reaction:
The correlation between the rate of the copper deposition on the catalytic surface and the concentration of the \({\text{Cu}}En_2^{2 + } \) complex species in the solution was found.
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Vaškelis, A., Norkus, E. & Jačiauskienė, J. Kinetics of electroless copper deposition using cobalt(II)-ethylenediamine complex compounds as reducing agents. Journal of Applied Electrochemistry 32, 297–303 (2002). https://doi.org/10.1023/A:1015599527638
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DOI: https://doi.org/10.1023/A:1015599527638