Abstract
The foundations of modern objective photometry (optical measurements) are considered. Possible directions for improving the system of assuring the uniformity of optical measurements through increasing the precision of engineering and reference measurements are analyzed. Four conceptual conclusions that determine the trends of past and future metrological investigations in the field of objective photometry are formulated.
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Ivanov, V.S., Kotyuk, A.F., Sapritskii, V.I. et al. Conceptual Foundations for the Assurance of the Uniformity of Measurements and for Increasing the Precision of Measurements in Modern Objective Photometry. Measurement Techniques 45, 157–163 (2002). https://doi.org/10.1023/A:1015539721643
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DOI: https://doi.org/10.1023/A:1015539721643