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Use of a Glow Discharge in a Magnetic Field for Production of Broad Ion Beams for Technological Applications

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Abstract

The results of investigations of the conditions of existence and ion-emission properties of a plasma of the high-current variety of a low-pressure glow discharge with a hollow cathode in a magnetic field are given. It has been shown that an applied weak magnetic field (∼10–3 T) not only reduces the minimum threshold gas pressure, but also makes the radial distribution of the plasma density more uniform (∼10%). A decrease in statistical straggling of the delay time to breakdown (∼102 times) and in discharge formative time (∼10 times) with increasing pulse repetition rate has been revealed to occur as a result of the transition to multielectron discharge initiation. The mass constitution of the discharge and the charge state of ions have been investigated and ways of lowering the content of the basic types of impurities have been determined. The influence of the parameters of the space charge cathode layer on the beam formation by electrostatic ion optics was investigated. The design of a source of gas ions possessing an increased lifetime and high reliability is described. The source is capable of producing an ion beam of cross section ∼100 cm2 with an energy of ions of up to 40 keV at an average current density of up to 1 mA/cm2.

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REFERENCES

  1. Surface Modification and Doping by Laser, Ion, and Electron Beams [Russian translation], Ed. by A.A. Uglov, Mashinostroenie, Moscow (1987).

  2. B. S. Danilin, Use of Low-Temperature Plasmas for Thin Film Deposition [in Russian], Energoatomizdat, Moscow (1989).

    Google Scholar 

  3. A. V. Kondyurin, R. I. Khaibullin, N. V. Gavrilov, and V. N. Popok, in: Proc. V All-Union Seminar on Physical and Physicochemical Fundamentals of Ion Implantation, Nizhny Novgorod, 2000, pp. 32–33.

  4. H. R. Kaufman, J. Vac. Sci. Technol., 21, 725–736 (1982).

    Google Scholar 

  5. S. P. Nikulin and S. V. Kuleshov, Zh. Tekh. Fiz., 70, 18–23 (2000).

    Google Scholar 

  6. N. V. Gavrilov and S. P. Nikulin, in: Proc. XVI Int. Symp. on Discharges and Electrical Insulations in Vacuum, SPIE, 2259, 118–121 (1994).

    Google Scholar 

  7. H. Raether, Electron Avalanches and Breakdown in Gases, Butterworth, London (1964).

    Google Scholar 

  8. N. V. Gavrilov and S. E. Romanov, Zh. Tekh. Fiz., 68, 20–24 (1999).

    Google Scholar 

  9. Yu. A. Korolev and G. A. Mesyats, Physics of Pulsed Breakdown of Gases [in Russian], Nauka, Moscow (1991).

    Google Scholar 

  10. P. N. Chistyakov and N. V. Tatarinova, Zh. Tekh. Fiz., 35, 1333–1355 (1965).

    Google Scholar 

  11. N. V. Gavrilov, D. R. Emlin, and S. V. Kuleshov, Rev. Sci. Instrum., 71, 3662–3667 (2000).

    Google Scholar 

  12. G. Aston, H. R Kaufman, and P. J. Wilbur, AIAA J., 16, 516–524 (1978).

    Google Scholar 

  13. N. V. Gavrilov and D. R. Emlin, Zh. Tekh. Fiz., 70, 74–81 (2000).

    Google Scholar 

  14. Yu. A. Kovalenko, Cand. Thesis (Phys. & Math.), Russian Electrotechnical Inst., Moscow (1995).

  15. N. V. Gavrilov, G. A. Mesyats, S. P. Nikulin, et al., J. Vac. Sci. Technol., A14, 1050–1055 (1996).

    Google Scholar 

  16. N. V. Gavrilov, G. A. Mesyats, G. V Radkovskii, and V. V. Bersenev, Surf. Coating Technol., 96, 81–88 (1997).

    Google Scholar 

  17. Sputtering of Solids by Ion Bombardment, Vol. II [Russian translation], Ed. by R. Berish, Mir, Moscow (1986).

    Google Scholar 

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Gavrilov, N.V., Emlin, D.R. & Nikulin, S.P. Use of a Glow Discharge in a Magnetic Field for Production of Broad Ion Beams for Technological Applications. Russian Physics Journal 44, 952–961 (2001). https://doi.org/10.1023/A:1014310006483

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  • DOI: https://doi.org/10.1023/A:1014310006483

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