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An optimized condition for corrosion protection of type 316L films prepared by unbalanced magnetron sputtering in 3.5% NaCl solution

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Center for Advanced Plasma Surface Technology, Sungkyunkwan University, 300 Chunchun-Dong, Jangan-Gu, Suwon, 440-746, South Korea

    O-Hyun Kwon, Seung-Ho Ahn & Jeon-Geon Han

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  1. O-Hyun Kwon
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  2. Seung-Ho Ahn
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  3. Jung-Gu Kim
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  4. Jeon-Geon Han
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Kwon, OH., Ahn, SH., Kim, JG. et al. An optimized condition for corrosion protection of type 316L films prepared by unbalanced magnetron sputtering in 3.5% NaCl solution. Journal of Materials Science Letters 21, 41–44 (2002). https://doi.org/10.1023/A:1014286426768

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  • DOI: https://doi.org/10.1023/A:1014286426768

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