Abstract
This study shows that conventional photolithography can be applied for patterning native or organic dye-doped silica films (∼0.5 μm thick) obtained via a base-catalyzed sol-gel process. Photoresist was spin-coated onto high optical quality xerogel films, soft-baked, exposed to UV irradiation through a photomask, and developed with a commercial photoresist developing solution. Etching away of the photoresist-unprotected areas of the silica films was carried out with a dilute HF solution, while the remaining unexposed photoresist was removed with acetone. Interdigitated array patterns with features as small as 0.5 mm show a smooth surface and extremely sharp interfaces. Densification of the films at 550°C for 2 h decreases the film thickness by ∼11%, increases the refractive index from 1.420 to 1.456, and allows for well-defined patterning down to length scales of 10 μm. Since the densification conditions are incompatible with organic dopants, it is demonstrated that sol-gel films can be doped after pattering (post-doping) by adsorption of cationic dyes from solution. Scanning electron microscopy reveals that the microstructure of patterned sol-gel films is similar to that of bulk monoliths, indicating that the photolithographic procedure is not harmful to the film quality. All patterned films demonstrate highly regular light diffraction patterns.
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Bohannan, E.W., Gao, X., Gaston, K.R. et al. Photolithographic Patterning and Doping of Silica Xerogel Films. Journal of Sol-Gel Science and Technology 23, 235–245 (2002). https://doi.org/10.1023/A:1013974915198
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DOI: https://doi.org/10.1023/A:1013974915198