Abstract
We propose two photonic crystal structures that can be created by combining nanolithography with alternating-layer deposition. Photonic band calculations suggest that a drilled alternating-layer photonic crystal combining two-dimensional (2D) alternating multilayers and an array of vertically drilled holes may achieve a full photonic bandgap. In addition, a 3D/2D/3D cross-dimensional photonic crystal, which sandwiches a 2D photonic crystal slab between three-dimensional (3D) alternating-layer photonic crystals, should provide better vertical confinement of light than a conventional index guiding slab. Fabrication techniques based on existing technologies (electron beam lithography, bias sputtering, and low-pressure ECR etching) require very few process steps. Our preliminary fabrication suggests that, by refining these technologies, we will be able to realize photonic crystals.
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Kuramochi, E., Notomi, M., Kawashima, T. et al. A new fabrication technique for photonic crystals: Nanolithography combined with alternating-layer deposition. Optical and Quantum Electronics 34, 53–61 (2002). https://doi.org/10.1023/A:1013326610166
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DOI: https://doi.org/10.1023/A:1013326610166