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Kinetics of Physical and Chemical Deposition of a Substance from the Gas Phase in Channels

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Abstract

Based on the molecular-kinetic approach, the processes of physical and chemical deposition of a substance from the gas phase on the interior surface of a channel are investigated. The problem of deposition of films which are uniform in thickness is discussed.

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Authors and Affiliations

  1. National Academy of Sciences of Belarus, Academic Scientific Complex “A. V. Luikov Heat and Mass Transfer Institute,”, Minsk, Belarus

    V. V. Levdanskii

  2. Academy of Sciences of the Czech Republic, Institute of Chemical Process Fundamentals, Prague, Czech Republic

    J. Smolik

Authors
  1. V. V. Levdanskii
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  2. J. Smolik
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Levdanskii, V.V., Smolik, J. Kinetics of Physical and Chemical Deposition of a Substance from the Gas Phase in Channels. Journal of Engineering Physics and Thermophysics 74, 1247–1252 (2001). https://doi.org/10.1023/A:1012996604333

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  • DOI: https://doi.org/10.1023/A:1012996604333

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