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Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions

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Abstract

In order to study physicochemical processes of formation of Ta2O5 and SiO2-Ta2O5 films from film-forming solutions, the properties of these solutions, and also the thermal-oxidative breakdown and the properties of the obtained films, were studied.

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Authors and Affiliations

  1. Tomsk State University, Tomsk, Russia

    R. V. Gryaznov, L. P. Borilo, V. V. Kozik & A. G. Mal'chik

Authors
  1. R. V. Gryaznov
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  2. L. P. Borilo
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  3. V. V. Kozik
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  4. A. G. Mal'chik
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Gryaznov, R.V., Borilo, L.P., Kozik, V.V. et al. Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions. Russian Journal of Applied Chemistry 74, 18–20 (2001). https://doi.org/10.1023/A:1012763009684

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  • DOI: https://doi.org/10.1023/A:1012763009684

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