Abstract
The formation of nickel-tantalum compounds in halide fluorotantalate melts was studied at 750°C. The mechanism of electroless tantalum plating onto nickel is considered and it is suggested that disproportionation underlies the spontaneous transfer.
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Matychenko, E.S., Zalkind, O.A., Kuznetsov, V.Y. et al. Formation of Nickel-Tantalum Compounds in NaCl-K2TaF7 Melts . Russian Journal of Applied Chemistry 74, 179–183 (2001). https://doi.org/10.1023/A:1012745311927
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DOI: https://doi.org/10.1023/A:1012745311927