Abstract
A novel thermal plasma process, based on Thermal Plasma Chemical Vapor Deposition (TPCVD) for producing nanostructured ceramics from liquid precursors is described. The process combines the rapid thermal decomposition of low-cost liquid precursors injected into an Inductively Coupled Plasma (ICP) with a fast gas phase condensation due to the high cooling rate and short residence time existing in such a plasma. Examples of synthesis of Si-based nanostructured ceramic materials (SiC, Si3N4) as powders or coatings are given. Deposition rates of up to 10 μm/min can be achieved by the present technique.
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Blum J., N. Tymiak, A. Neuman, Z Wong, N.P. Rao, S.L. Girshick, W.W. Gerberich, P.H. McMurry & J.V.R. Heberlein, 1999.J. Nanopar. Res. 1, 31.
Boulos M.I., P. Fauchais & E. Pfender, 1994.Thermal Plasmas, Fundamental and Applications.Plenum, New York.
Boulos M.I., 1985.Pure Appl. Chem. 57, 1321.
Bouyer E., M. Müller, G. Schiller & R.H. Henne, 2001.Appl. Organome. Chem. (in press).
Bouyer E., F. Gitzhofer & M.I. Boulos, 1997.JOM 49, 58.
Carmer C.S. & M. Frenklach, 1989.Appl. Phys. Lett. 54, 1430.
Chen Y., N. Glumac, B.-H. Kear & G. Skandan, 1997.Nanostruct. Mater. 9, 101.
Eberhart J.-P., 1994.Structural and Chemical Analysis of Materials: X-ray, Electron and Ion Spectrometry.Wiley, New York.
Fauchais P., A. Grimaud, A. Vardelle & M. Vardelle, 1989.Ann. Phys. 14, 261 (text in French).
Fauchais P., A. Vardelle & A. Denoirjean, 1997.Surf. Coat. Technol. 97, 66.
Girshick S.L. & C.-P. Chiu, 1989.Plasma Chem. Plasma Process. 9, 355.
Gleiter H., 1992.Nanostruct. Mater. 1, 1.
Hahn H., 1997.Nanostruct. Mater. 9, 3.
Kagawa M., Y. Imamura, S. Usui & Y. Syono, 1984.J. Mater. Sci. Lett. 3, 699.
Karthikeyan J., C.C. Berndt, S. Reddy, J.-Y., Wang, A.H. King & H. Herman, 1998.J. Am. Ceram. Soc. 81, 121.
Klein S., M. Winterer & H. Hahn, 1998.Chem.Vapor Dep. 4, 143.
Kodas T.T. & M. Hampden-Smith, 1999.Aerosol Processing of Materials.Wiley-VCH, New York.
Lefebvre A.H., 1989.Atomization and Sprays.Hemisphere Publishing Co., New York.
Pfender E., H. Zhu & Y.C. Lau, 1991.Mater. Sci. Eng. A139, 352.
Rao N., S. Girshick, J. Heberlein, P. McMurry, S. Jones, D. Hansen, & B. Micheel, 1995.Plasma Chem. Plasma Process. 15, 581.
Rochow E.G., 1951.An Introduction to the Chemistry of the Silicones, 2nd edition.John Wiley & Sons, New York.
Vollath D. & D.V. Szabo, 1994.Nanostruct. Mater. 4, 927.
Vollath D. & D.V. Szabo, 2000.Acta Mater. 48, 953.
Yoshida T.,1994.Pure & Appl. Chem. 6, 1223.
Zhu H., Y.C. Lau & E. Pfender, 1991.J. App. Phys. 65, 3404.
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Bouyer, E., Müller, M., Henne, R. et al. Thermal Plasma Processing of Nanostructured Si-based Ceramic Materials. Journal of Nanoparticle Research 3, 371–376 (2001). https://doi.org/10.1023/A:1012546917064
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DOI: https://doi.org/10.1023/A:1012546917064