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Temperature dependence of resistance in reactively sputtered RuO2 thin films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Electronic and Information Engineering, The Hong Kong Polytechnic University, Hong Kong

    K. Y. Tong & V. Jelenkovic

  2. Department of Electronic Engineering and Materials Technology Research Center, The Chinese University of Hong Kong, Hong Kong

    W. Y. Cheung & S. P. Wong

Authors
  1. K. Y. Tong
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  2. V. Jelenkovic
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  3. W. Y. Cheung
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  4. S. P. Wong
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Tong, K.Y., Jelenkovic, V., Cheung, W.Y. et al. Temperature dependence of resistance in reactively sputtered RuO2 thin films. Journal of Materials Science Letters 20, 699–700 (2001). https://doi.org/10.1023/A:1010902806603

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  • DOI: https://doi.org/10.1023/A:1010902806603

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