Effect of Water Vapor on the Oxidation Behavior of Fe–1.5Si in Air at 1073 and 1273 K

Abstract

The oxidation behavior of Fe–1.5Si was investigated at 1073 and 1273 K in air, air–H₂O, Ar–H₂O, O₂–H₂O, and O₂ atmospheres. The extent of corrosion in atmospheres containing H₂O increased rapidly after an incubation period of slow oxidation, the incubation period becoming shorter in the order, O₂–H₂O, air–H₂O, and Ar–H₂O. With increasing H₂O contents in air–H₂O, the incubation time decreased. During the incubation period, oxidation was slow, because of the formation of an inner Si-rich oxide layer and a Pt marker was located between the external Fe₂O₃ (Fe₃O₄ included) and an inner Si-rich oxide layer. During the rapid oxidation, the inner FeO+Fe₂SiO₄ layer thickened and a Pt maker was at the interface between an external Fe-oxide and an inner FeO+Fe₂SiO₄ layer. Observations of scale cross sections indicated that voids made channels along the boundaries of columnar FeO crystals, suggesting transport of water molecules. The Si-rich oxide layer changed into an FeO+Fe₂SiO₄ mixture due to penetration of water molecules. A combined process of perforating dissociation and transport of water molecules is suggested to be the cause of the rapid growth of the inner FeO+Fe₂SiO₄ layer.