Abstract
The naturally occurring compounds of thorium ThSiO4, ThSiO4· nH2O, and (Th, Fe)SiO4 and uranium USiO4· nH2O have been studied by X-ray photoelectron spectroscopy in the range of electron binding energies from 0 to 1200 eV. The oxidation state of Th in the natural compounds is close to that in Th(OH)4; for uranium, it is similar to that in UO2. Based on the structure of the low-energy electron spectra it is assumed that the electrons of the filled Th6p- and O2s-atomic orbitals take an active part in chemical bonding. Fine structure was observed in the Th(U)6s-, 5d-, 5p-, 4f-, 4d-, and 4p 3/2 electron spectra of all substances under study. Mechanisms of fine structure formation are discussed and the fine structure parameters are correlated with the physicochemical properties of the compounds.
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Teterin, Y.A., Utkin, I.O., Melnikov, I.V. et al. X-Ray Photoelectron Study of Thorium Silicate ThSiO4 · nH2O and Uranium Silicate USiO4·nH2O. Journal of Structural Chemistry 41, 965–971 (2000). https://doi.org/10.1023/A:1010302805492
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DOI: https://doi.org/10.1023/A:1010302805492