Abstract
An atomic force microscopy study of the surface roughness of CdTe thin films growth by the close-space vapor transport technique on Corning glass substrate under different growth conditions (substrate temperature, Cd overpressure, and annealing) is presented. The roughness measurements show that under certain growth conditions the surface of the micro-crystals is flatter—on the micrometer scale—than in the case of CdTe layers grown by molecular beam epitaxy (MBE) on a CdTe substrate. ©1999 Kluwer Academic Publishers
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Aguilar, M., Oliva, A.I. & Ceh, O. Effect of growth conditions on the flatness of micro-crystal terraces of CdTe thin film. Journal of Materials Science: Materials in Electronics 10, 45–49 (1999). https://doi.org/10.1023/A:1008927123544
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DOI: https://doi.org/10.1023/A:1008927123544