Abstract
β-FeSi2 is an important semiconducting silicide which is being studied extensively. In this paper, we report our results of the effect of laser and laser-thermal annealing on the properties of β-FeSi2. 5N purity Fe was deposited on Si substrate and was subsequently irradiated by CW and pulsed laser separately followed by thermal annealing to reduce the laser induced damage. The samples were then characterized by sheet resistance, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), optical reflectance and absorption studies. Lastly, β-FeSi2/n-Si heterojunctions were fabricated and the effect of laser treatment on the junction ideality factor was investigated. All these characterizations indicated the formation of good quality β-FeSi2, particularly after pulsed laser followed by thermal treatment.
Similar content being viewed by others
References
J. Winnerl, Semicond. Int. (Aug 1994) 81.
A. B. Filonov et al., J. Appl. Phys. 79 (1996) 7708.
M. C. Bost and J. E. Mahan, ibid. 58 (1985) 2696.
Idem., ibid. 64 (1988) 2034.
E. D' Anna, G. Leggieri and A. Luches, Appl. Phys. A 45 (1988) 325.
J. Pankov, “Optical Processes in Semiconductors” (Dover, New York, 1971).
M. Ozvold et al., Thin Solid Films 263 (1995) 92.
K. Radermacher, R. Cariusand S. Mantl, Nucl. Instrum. Methods Phys. Res. B 84 (1994).
C. A. Dimitriadiset al., J. Appl. Phys. 68 (1990) 1726.
U. Erlesand and M. Ostling, Appl. Phys. Lett. 68 (1996) 105.
C. A. Dimitriadis, J. Appl. Phys. 70 (1991) 5423.
M. Michelini, F. Nava and E. Galli, J. Mater. Res. 6 (1991) 1655.
Y. Dusausoy, J. Protas, R. WandjI and B. Roques, Acta Crystallogr. B 27 (1971) 1029.
BUCKSH, Z. Nat. forsch A 22 (1997) 2124
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Datta, A., Kal, S., Basu, S. et al. Characterization of laser and laser/thermal annealed semiconducting iron silicide thin films. Journal of Materials Science: Materials in Electronics 10, 627–631 (1999). https://doi.org/10.1023/A:1008908317850
Issue Date:
DOI: https://doi.org/10.1023/A:1008908317850