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Preparation of Thick Films by Electrophoretic Deposition Using Surface Modified Silica Particles Derived from Sol-Gel Method

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Abstract

Thick films were prepared by the electrophoretic sol-gel deposition of organically modified, sub-micron silica particles. The silica particles were modified with 3-aminopropyltriethoxysilane (APS) and vinyltriethoxysilane (VTES). Smooth and crack-free films ca. 15 μm thick were obtained when APS modified silica particles were used for the cathodic electrophoretic deposition. Thick films with decreased open spaces among particles were obtained when silica particles modified with VTES were co-deposited with an organic polymer, polyethylene maleate.

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Authors and Affiliations

  1. Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka, 599-8531, Japan

    Koichi Hasegawa, Shunsuke Kunugi, Masahiro Tatsumisago & Tsutomu Minami

Authors
  1. Koichi Hasegawa
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  2. Shunsuke Kunugi
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  3. Masahiro Tatsumisago
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  4. Tsutomu Minami
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Hasegawa, K., Kunugi, S., Tatsumisago, M. et al. Preparation of Thick Films by Electrophoretic Deposition Using Surface Modified Silica Particles Derived from Sol-Gel Method. Journal of Sol-Gel Science and Technology 15, 243–249 (1999). https://doi.org/10.1023/A:1008789025826

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  • DOI: https://doi.org/10.1023/A:1008789025826

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