Abstract
In this paper, we attempt to formally establish the chemistry of a vapor-gel process for the low temperature deposition of thin films. A number of applications of such a process will be discussed mostly on a theoretical basis, with the exception of one or two particular aspects that we have experimentally demonstrated so far. The essential components of the deposition apparatus will be described in detail along with some discussions on their operation conditions. Finally, we conclude this paper by systematically comparing the vapor-gel method to other well-known thin film fabrication techniques including the sol-gel method.
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Xu, R. Vapor-Gel Deposition Method for Oxide Thin Films. Journal of Sol-Gel Science and Technology 11, 131–140 (1998). https://doi.org/10.1023/A:1008644013056
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DOI: https://doi.org/10.1023/A:1008644013056