References
P. R Van Loan, Ceram.Bull. 51(3) (1972) 231.
A. W. Sleight, Mater.Res.Bull. 6(8) (1971) 775.
J. W. Pierce, D. W. Kuty and J. L. Larry, Solid State Technol. 25(10) (1982) 85.
R. W. Vest, Ceram.Bull. 65(4) (1986) 631.
T. Inokuma and Y. Taketa, Active and Passive Elect. Comp. 12(3) (1987) 155.
O. Abe, Y. Taketa and M. Haradome, ibid. 13(2) (1988) 76.
M. Prudenziati, B. Morten and A. Maseoro, J.Phys.D: Appl.Phys. 14(7) (1981) 1355.
T. Yamaguchi and S. Kato, Ceram.Trans. 15(1990) 575.
B. Morten, A. Masoero, M. Prudenziati and T. Manfredini, J.Phys.D: Appl.Phys. 27(10) (1994) 2227.
K. Adachi, S. Iida and K. Hayashi, J.Mater.Res. 9(7) (1994) 1866.
A. T. Walker, L. A. Silverman, K. W. Hang, T. Pfeitfer, V. P. Siuta, L. H. Slack and R. J. Bouchadr, in Proc. Int. Symp. Microelectronics ISHM-93, Dallas, Nov. 1993, p. 695.
P. O'Callaghan, A. T. Walker, K. W. Hang, V. P. Siuta, J. J. Osborne, J. Smith, K. Hayakawa and A. Buckthorpe, Microelectronics Int. 37(1995) 14.
M. Hrovat, D. BelaviČ and Z. SamardŽija, J.Mater. Sci.Lett., to be published.
H. S. Horowitz, J. M. Longo and J. T. Lewandowski, Mater.Res.Bull. 16(5) (1981) 489.
R. J. Bouchard and L. J. Gillson, ibid. 6(8) (1971) 669.
M. A. Subramanian, G. Aravamudan and G. V. S. Rao, Solid State Chem. 24(1981) 55.
M. Hrovat, Z. SamardŽija, J. Holc and D. BelaviČ, J.Mater.Sci.; Materials in Electronics, to be published.
K. Adachi and H. Kuno, J.Am.Ceram.Soc. 80(5) (1997) 1055.
T. V. Nordstrom and C. R. Hills, in Proc. Int. Hybrid Microelectronics Symp. ISHM-79, Los Angeles, 1979, p. 40.
A. Kubovy, J.Phys.D: Appl.Phys. 19(1986) 2127.
M. Hrovat, G. DraŽiČ, J. Holc and D. BelaviČ, J.Mater.Sci.Lett. 14(15) (1995) 1048.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Hrovat, M., Samardžija, Z., Holc, J. et al. Microstructural and electrical characteristics of some “overfired” thick-film resistors. Journal of Materials Science Letters 20, 347–351 (2001). https://doi.org/10.1023/A:1006798006010
Issue Date:
DOI: https://doi.org/10.1023/A:1006798006010