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Structure and electrical properties of RF-sputtering deposited thin ferroelectric Pb(Zr0.52Ti0.48)O3 films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Physics, Faculty of Science, Chiang Mai University, Chiang Mai, 50200, Thailand

    T. Tunkasiri, W. Nhuapeng & W. Thamjaree

  2. Department of Physics, Jinan University, Guangzhou, 510632, People's Republic of China

    Ye Qin

Authors
  1. T. Tunkasiri
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  2. Ye Qin
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  3. W. Nhuapeng
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  4. W. Thamjaree
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Tunkasiri, T., Qin, Y., Nhuapeng, W. et al. Structure and electrical properties of RF-sputtering deposited thin ferroelectric Pb(Zr0.52Ti0.48)O3 films. Journal of Materials Science Letters 19, 1913–1916 (2000). https://doi.org/10.1023/A:1006751130581

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