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A New Metal-Organic Precursor for the Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Zinc Oxide Films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Chemistry and Materials Research Science and Engineering Center, Houston, TX, 77204, USA

    S. Suh & D. M. Hoffman

  2. Los Alamos National Laboratory, Los Alamos, NM, 87545, USA

    L. M. Atagi & D. C. Smith

Authors
  1. S. Suh
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  2. D. M. Hoffman
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  3. L. M. Atagi
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  4. D. C. Smith
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Suh, S., Hoffman, D.M., Atagi, L.M. et al. A New Metal-Organic Precursor for the Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Zinc Oxide Films. Journal of Materials Science Letters 18, 789–791 (1999). https://doi.org/10.1023/A:1006689017053

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