References
A. Matsuda, S. Yamasaki, K. Nakayama, H. Okushi, K. Tanaka, S. Iizima, M. Matsumura and H. Yamamoto, Jpn. J. Appl. Phys. 19 (1980) L305.
H. Richter and L. Ley, J. Appl. Phys. 52 (1981) 7281.
S. Usui and M. Kikuchi, J. Non-Cryst. Solids 34 (1979) 1.
T. D. Moustakas, H. P. Maruska and R. Friedman, J. Appl. Phys. 58 (1985) 983.
Y. Uchida, T. Ichimura, M. Ueno and H. Haruki, Jpn. J. Appl. Phys. 21 (1986) L586.
H. Okada, Y. Uchida and M. Matsumura, ibid. 25 (1986) L718.
Y. Hamakawa, T. Toyama and H. Okamoto, J. Non-Cryst. Solids 115 (1989) 180.
S. Fujikake, H. Ohata, A. Asano, Y. Ichikawa and H. Sakai, Mat. Res. Soc. Symp. Proc. 258 (1992) 875.
S. Fujikake, H. Ohta, P. Sichanugrist, M. Ohsawa, Y. Ichikawa and H. Sakai, Optoelectronics: Devices Technol. 9 (1994) 379.
D. Kruangam, K. Hamaki, S. Nonomara, H. Okamoto and Y. Hamahawa, “Proceedings of Technical Digest of International PVSEC, Kobe, 1984”, edited by Y. Hamakawa (Japan Convention Services, Tokyo, 1984) p. 437.
D. Das, S. M. Iftiquar and A. K. Barua, J. Non-Cryst. Solids 210 (1997) 148.
G. Lucovsky, Solar Energy Mater. 8 (1992) 165.
G. Lucovsky, J. Yang, S. S. Chao, J. E. Tyler and W. Czubatyj, Phys. Rev. B. 28 (1983) 3225.
P. Sichanugrist, T. Yoshida, Y. Ichikawa and H. Sakai, J. Non-Cryst. Solids 164–166 (1993) 1081.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Das, D., Mandal, S. & Barua, A.K. Intrinsic Hydrogenated Microcrystalline Silicon Oxide Films Prepared by RF Glow Discharge. Journal of Materials Science Letters 17, 2097–2100 (1998). https://doi.org/10.1023/A:1006688218232
Issue Date:
DOI: https://doi.org/10.1023/A:1006688218232