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Additive oxygen effects in Cl2 plasma etching of chrome films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Electronic Engineering,, Hanseo University,, 360, Daegok-Ri, Haemi-Myun, Seosan-Si,, Chung-Nam,, 356-820,, Korea

    Kwang-Ho Kwon

  2. Electronics and Telecommunication Research Institute, Yusong, P.O. Box 106,, Taejon, 305-600,, Korea

    Seung-Youl Kang, Sang-Ho Park & Hee-Kyung Sung

  3. Department of Metallurgical Engineering,, Chonnam National University,, Kwangju,, 500-757,, Korea

    Dong-Keun Kim

  4. Department of Ceramic Engineering,, Chonnam National University,, Kwangju,, 500-757,, Korea

    Jong-Ha Moon

Authors
  1. Kwang-Ho Kwon
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  2. Seung-Youl Kang
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  3. Sang-Ho Park
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  4. Hee-Kyung Sung
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  5. Dong-Keun Kim
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Kwon, KH., Kang, SY., Park, SH. et al. Additive oxygen effects in Cl2 plasma etching of chrome films. Journal of Materials Science Letters 18, 1197–1200 (1999). https://doi.org/10.1023/A:1006642016630

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