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Electrical Properties of TiNx Films on p-silicon Substrates Obtained by Reactive Ion Beam Assisted Deposition Technique

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Journal of Materials Science Letters

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Authors
  1. A. M. Narsale
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  2. Yousuf Pyar Ali
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  3. D. C. Kothari
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  4. L. Guzman
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  5. A. Miotello
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Narsale, A.M., Ali, Y.P., Kothari, D.C. et al. Electrical Properties of TiNx Films on p-silicon Substrates Obtained by Reactive Ion Beam Assisted Deposition Technique. Journal of Materials Science Letters 17, 637–639 (1998). https://doi.org/10.1023/A:1006603820529

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