Abstract
Morphological and structural evolution of titanium oxide andchromium oxide films D.C. and R.F. sputtered were investigated.These materials were deposited on fused quartz and siliconwafers from pure metallic targets in mixed Ar-O2 discharge.Transformations of the optical properties and crystallographicstructures were observed for layers deposited at hightemperature. The influence of D.C. or R.F. polarization on somecharacteristics of the coatings was also investigated. Bothmaterials showed an amorphous structure for substratetemperatures up to 400 °C and a clear increase of layer densitywas illustrated from optical measurements. R.F. sputteringexhibited a strong effect on microstructure of the filmscompared to D.C. sputtering. This observation is discussed andsome explanations of this phenomenon are proposed.
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Martin, N., Rousselot, C. Synthesis of TiOx and CrOy coatings prepared at high temperature. Journal of Materials Science 35, 3583–3591 (2000). https://doi.org/10.1023/A:1004817730784
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DOI: https://doi.org/10.1023/A:1004817730784