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High-Temperature Oxidation of Ti0.3Al0.2N0.5 Thin Films Deposited on a Steel Substrate by Ion Plating

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Abstract

To improve the high-temperature oxidation resistance of STD61 steels used ashot dies or cutting tools, Ti0.3Al0.2N0.5films were deposited on STD61 steel substrates by arc-ion plating. Thedeposited film consisted of Ti3Al2N2 andTi2N phases. The oxidation characteristics were studied attemperatures ranging from 700 to 900°C in air. The deposited STD61steels displayed excellent oxidation resistance up to 800°C, butexhibited large weight gains and breakaway oxidation at 900°C. Theoxidation products were primarily Fe2O3, TiO, TiO2,and α-Al2O3, the relative amount of each oxidebeing dependent on the oxidation condition. Among various oxides, TiO2and α-Al2O3 were the major oxides at 800°Cfor at least up to 16 hr. However, at a higher temperature or a longeroxidation period, the significant outward diffusion of iron from thesubstrate resulted in the formation of iron oxides, together with otheroxides of Ti and Al.

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Authors and Affiliations

  1. Department of Metallurgical Engineering, Sungkyunkwan University, Suwon, 440-746, South Korea

    J. H. Woo & D. B. Lee

  2. Department of Materials Engineering, Soonchunhyang University, Shinchang, 337-745, South Korea

    J. K. Lee

  3. Thin Films Processing Laboratory, Korea Institute of Machinery and Metals, Changwon, 641–010, South Korea

    S. R. Lee

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  1. J. H. Woo
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  2. J. K. Lee
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  3. S. R. Lee
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  4. D. B. Lee
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Woo, J.H., Lee, J.K., Lee, S.R. et al. High-Temperature Oxidation of Ti0.3Al0.2N0.5 Thin Films Deposited on a Steel Substrate by Ion Plating. Oxidation of Metals 53, 529–537 (2000). https://doi.org/10.1023/A:1004685010393

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