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X-ray diffraction and X-ray photoelectron spectra of Fe-Cr-N films deposited by DC reactive sputtering

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Abstract

The effects of nitrogen flow ratio, target area ratio of Cr, and substrate temperature on the structure of DC reactive sputtered Fe-Cr-N ternary films have been studied. X-ray diffraction measurements show that Fe-Cr-N films consist of α-Fe(Cr) and γ′-(Fe,Cr)4Nx (x < 1) phases. The crystal grain of the α-Fe(Cr) phase becomes finer and a (200) texture of the γ′-(Fe,Cr)4Nx phase becomes more marked with increasing the nitrogen flow ratio. X-ray photoelectron spectra of the films show that oxidation resistance of Fe-Cr-N films is superior to that of Fe-N films, and oxides are formed only in the film surface due to contacting with the ambient atmosphere and oxygen contamination is very small in the inner parts of these films.

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Authors and Affiliations

  1. Institute for Materials Research, Tohoku University, Sendai, 980-8577, Japan

    D. L. Peng, K. Sumiyama, M. Oku, T. J. Konno, K. Wagatsuma & K. Suzuki

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  1. D. L. Peng
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  2. K. Sumiyama
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  3. M. Oku
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  4. T. J. Konno
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  5. K. Wagatsuma
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  6. K. Suzuki
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Peng, D.L., Sumiyama, K., Oku, M. et al. X-ray diffraction and X-ray photoelectron spectra of Fe-Cr-N films deposited by DC reactive sputtering. Journal of Materials Science 34, 4623–4628 (1999). https://doi.org/10.1023/A:1004638700680

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