Journal of Materials Science

, Volume 38, Issue 3, pp 421–425 | Cite as

Characterization of Ti-containing amorphous carbon films prepared on titanium substrates

  • D. Sheeja
  • B. K. Tay
  • C. Q. Sun
  • Y. Q. Fu


Amorphous carbon (a:C) films prepared on pure titanium (Ti) substrates exhibit relatively high intrinsic compressive stress. In order to obtain low stress films with varied electrical and mechanical properties, metal (Ti) ions are incorporated into the plasma. This is done with the help of metal containing carbon targets. Amorphous carbon films with varied percentage of Ti were deposited on polished pure Ti substrates using Filtered Cathodic Vacuum Arc (FCVA) technique together with substrate pulse biasing. Characterizations of the films were carried out using various equipments including Raman Spectroscopy, X-ray diffractometer, Atomic Force Microscopy (AFM), Pin-on-Disk Tribometer and Micro-Scratch Tester; and properties such as microstructure, crystallography, film stress, morphology, frictional coefficient and critical load were investigated as a function of Ti content in the target. The results suggest that the film prepared with 5 at.% Ti-containing carbon target, under 7 kV substrate pulse bias voltage, displays almost zero stress. However such films are inferior in its Tribological properties compared to that of pure a:C films.


Atomic Force Microscopy Raman Spectroscopy Tribological Property Frictional Coefficient Titanium Substrate 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Kluwer Academic Publishers 2003

Authors and Affiliations

  • D. Sheeja
    • 1
  • B. K. Tay
    • 1
  • C. Q. Sun
    • 1
  • Y. Q. Fu
    • 1
  1. 1.School of Electrical and Electronic EngineeringNanyang Technological UniversitySingapore

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