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Study of Phase Formations in ε-FeSi Layers by Pulsed Laser Annealing

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Abstract

Pulsed laser annealing has been applied on ε-FeSi layers in order to study the formation of (meta)stable iron silicides. Laser shots of different energy density were applied and/or the number of laser shots was also varied. Characterisation was performed using Rutherford Backscattering Spectroscopy (RBS)/Channelling and Conversion Electron Mössbauer Spectroscopy (CEMS). The reaction mechanisms of the Fe/Si system as well as the stability of the phases are discussed.

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Authors and Affiliations

  1. I.K.S., Catholic University of Leuven, Celestijnenlaan 200D, B-3001, Leuven, Belgium

    A. Falepin

  2. University of Cape Town, Rondebosch, 7700, South Africa

    C. M. Comrie

  3. I.K.S., Catholic University of Leuven, Celestijnenlaan 200D, B-3001, Leuven, Belgium

    A. Vantomme & G. Langouche

Authors
  1. A. Falepin
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  2. C. M. Comrie
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  3. A. Vantomme
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  4. G. Langouche
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Falepin, A., Comrie, C.M., Vantomme, A. et al. Study of Phase Formations in ε-FeSi Layers by Pulsed Laser Annealing. Hyperfine Interactions 134, 153–160 (2001). https://doi.org/10.1023/A:1013893311077

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