Advertisement

Journal of Applied Electrochemistry

, Volume 30, Issue 12, pp 1345–1350 | Cite as

Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment

  • D. Gandini
  • E. Mahé
  • P.A. Michaud
  • W. Haenni
  • A. Perret
  • Ch. Comninellis
Article

Abstract

Thin boron-doped diamond films have been prepared by HF CVD (hot filament chemical vapour deposition technique) on conductive p-Si substrate (Si/Diamond). The morphology of these Si/diamond electrodes has been investigated by SEM and Raman spectroscopy. The electrochemical behaviour of the Si/diamond electrodes in 1 M H2SO4 and in 1 M H2SO4 + carboxylic acids has been investigated by cyclic voltammetry. Finally, the electrochemical oxidation of some simple carboxylic acids (acetic, formic, oxalic) has been investigated by bulk electrolysis. These acids can be oxidized at Si/diamond anodes to CO2, in the potential region of water and/or the supporting electrolyte decomposition, with high current efficiency.

boron-doped diamond electrodes electrochemical oxidation organics wastewater treatment 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    Ch. Comninelis and E. Plattner, Chimia 42 (1988) 250.Google Scholar
  2. 2.
    Ch. Comninellis and C. Pulgarin, J. Appl. Electrochem. 21 (1991) 703.Google Scholar
  3. 3.
    Ch. Comninellis, Gas, Wasser, Abwasser. 11 (1992) 792.Google Scholar
  4. 4.
    Ch. Comninellis and C. Pulgarin, J. Appl. Electrochem. 23 (1993) 108.Google Scholar
  5. 5.
    Ch. Comninellis, E. Plattner, C. Seignez, C. Pulgarin and P. Péringer, Swiss Chem. 14 (1992) 25.Google Scholar
  6. 6.
    C. Pulgarin, N. Adler and P. Péringer and Ch. Comninellis, Water Res. 28 (1994) 887.Google Scholar
  7. 7.
    Ch. Comninellis and A. De Battisti, J. Chim. Phys. 93 (1996) 673.Google Scholar
  8. 8.
    Ch. Comninellis, Electrochim. Acta. 39 (1994) 1857.Google Scholar
  9. 9.
    O. Simond, V. Schaller and Ch. Comninellis, Electrochim. Acta. 42 (1997) 2009.Google Scholar
  10. 10.
    G. Foti, D. Gandini and Ch. Comninellis, Curr. Top. Electrochem. 5 (1997) 71.Google Scholar
  11. 11.
    G.M. Swain, A.B. Anderson and J.C. Angus, MRS Bull. 9 (1998) 56.Google Scholar
  12. 12.
    N. Vinokur, B. Miller, Y. Avyigal and R. Kolish, J. Electrochem. Soc. 146 (1999) 125.Google Scholar
  13. 13.
    R. Ramesham, J. Mater. Sci. 34 (1999) 1439.Google Scholar
  14. 14.
    Yu.V. Pleskov, Yu.E. Evstefeeva, M.D. Kvotova and V. Laptev, Electrochim. Acta. 44 (1999) 3361.Google Scholar
  15. 15.
    Y. Yano, D.A. Tryk, K. Hashimoto and A. Fujishima, J. Electrochem. Soc. 145 (1998) 1870.Google Scholar
  16. 16.
    J.J. Carey, W. Henrietta, C.S. Christ Jr., S.N. Lowery, US Patent 5 399 247 (1995).Google Scholar
  17. 17.
    W. Haenni, H. Baumann, Ch. Comninellis, D. Gandini, P. Niedermann, A. Perret and N. Skinner, Diam. Relat. Mater. 7 (1998) 569.Google Scholar
  18. 18.
    A. Perret, W. Haenni, P. Niedermann, H. Baumann, N. Skinner, Ch. Comninellis and D. Gandini, Electrochem. Soc. Proc. 32 (1997) 275.Google Scholar
  19. 19.
    A. Perret, W. Haenni, N. Skinner, X.-M. Tang, Ch. Comninellis, D. Gandini, B. Correa and G. Foti, Diam. Relat. Mater. 8 (1999) 820.Google Scholar
  20. 20.
    V. Fisher, D. Gandini, S. Laufer, E. Blank and Ch. Comninellis, Electrochim. Acta. 44 (1998) 521.Google Scholar
  21. 21.
    J.P. Taylor and J.C. Neygant, Can. J. Chem. 52 (1974) 1925.Google Scholar
  22. 22.
    M. Peleg, Water Res. 10 (1976) 361.Google Scholar
  23. 23.
    R. De Clements and G. Swain, J. Electrochem. Soc. 144 (1997) 856.Google Scholar
  24. 24.
    P-A. Michaud, E. Mahé, W. Haenni, A. Perret and Ch. Comninellis, Electrochem. Solid-State Lett., in press.Google Scholar

Copyright information

© Kluwer Academic Publishers 2000

Authors and Affiliations

  • D. Gandini
    • 1
  • E. Mahé
    • 1
    • 2
  • P.A. Michaud
    • 1
  • W. Haenni
    • 3
  • A. Perret
    • 3
  • Ch. Comninellis
    • 1
  1. 1.Institute of Chemical EngineeringSwiss Federal Institute of TechnologyLausanneSwitzerland
  2. 2.On leave from UMR 7612 LI2C-CNRS-UPMCParis Cedex 05France
  3. 3.CSEM Centre Suisse d'Electronique et de Microtechnique S.ANeuchâtelSwitzerland

Personalised recommendations