Journal of Materials Science

, Volume 32, Issue 14, pp 3727–3732 | Cite as

Effect of silicon ion implantation on the properties of a cast Co–Cr–Mo alloy

  • M Kaminski
  • J Baszkiewicz
  • J Kozubowski
  • A Bednarska
  • A Barcz
  • G Gawlik
  • J Jagielski


The effect of silicon ion implantation upon the corrosion resistance and structure of the cast Co–Cr–Mo alloy of the Vitalium type, was examined. The silicon fluences were 1.5, 3.0 and 4.5 × 1017Si+ cm-2. The surface layer of the Vitalium samples implanted with these silicon doses was found to become amorphous. Further annealing of the samples at 200 °C resulted in the Cr3Co5Si2 phase being formed, whereas the amorphous layer was preserved. The Vitalium samples submerged in the 0.9% NaCl solution underwent mainly uniform corrosion, irrespective of whether or not they had been implanted with Si+ ions. With increasing doses of implanted silicon and after annealing at 200 °C (samples implanted with 1.5 × 1017Si+ cm-2), the corrosion resistance increased. The thickness of the oxide layer formed during the anodic polarization depended on the implanted silicon doses.


Corrosion Resistance Anodic Polarization Polarization Resistance Corrosion Current Density Crevice Corrosion 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Chapman and Hall 1997

Authors and Affiliations

  • M Kaminski
    • 1
  • J Baszkiewicz
    • 2
  • J Kozubowski
    • 3
  • A Bednarska
  • A Barcz
  • G Gawlik
  • J Jagielski
  1. 1.Warsaw University of TechnologyWarsawPoland
  2. 2.Institute of Electron TechnologyWarsawPoland
  3. 3.Institute of Electronics Materials Technology (IEMT)WarsawPoland

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