Tribology Letters

, Volume 12, Issue 3, pp 189–193 | Cite as

Molecular Interlayers and the Mechanism of Abrasive Wear of Ultrathin Metal Films

  • F.T. Xu
  • P.P. Ye
  • M. Curry
  • J.A. Barnard
  • S.C. Street
Article

Abstract

Striking differences have been observed in the deformation modes associated with nanoscratch events on ultrathin Cu layers deposited on SiOx with and without a dendrimer interlayer. In the absence of the dendrimer monolayer significant lateral deformation and distinct ridge formation along the wear track indicative of plowing and wedge formation are observed. By contrast, dendrimer monolayer-mediated films exhibit restricted lateral deformation yielding ridgeless scratches apparently formed in a nearly pure cutting mode.

dendrimers nanotribology hybrid nanocomposites ultrathin metal films 

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References

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Copyright information

© Plenum Publishing Corporation 2002

Authors and Affiliations

  • F.T. Xu
    • 1
  • P.P. Ye
    • 2
  • M. Curry
    • 2
  • J.A. Barnard
    • 3
  • S.C. Street
    • 2
  1. 1.Department of Metallurgical and Materials EngineeringThe University of AlabamaTuscaloosa
  2. 2.Department of Chemistry, The Center for Materials for Information TechnologyThe University of AlabamaTuscaloosa
  3. 3.Department of Materials Science and EngineeringUniversity of PittsburghPittsburgh

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