A functionally graded titanium/hydroxyapatite film obtained by sputtering

  • Kazuhide Ozeki
  • Toshio Yuhta
  • Yasuhiro Fukui
  • Hideki Aoki
  • Ikuya Nishimura
Article

Abstract

A functionally graded film of titanium/hydroxyapatite (HA) was prepared on a titanium substrate using a radio frequency magnetron sputtering. The ratio of titanium to HA was controlled by moving the target shutter. The film was composed of five layers, with overall film thickness of 1 μm. The HA was concentrated close to the surface, while the titanium concentration increased with proximity to the substrate. The bonding strength between the film and the substrate was 15.2 MPa in a pull-out test and the critical load from a scratch test was 58.85 mN. The corresponding values of a pure HA sputtered film were 8.0 MPa and 38.47 mN, respectively. The bonding strength of a pure HA plasma spray coating was 10.4 MPa in the pull-out test. The graded film and the pure HA film were sputter-coated to a thickness of 1 μm on titanium columns (10 mm in length and 4 mm in diameter). These columns were implanted in diaphyses of the femora of six adult dogs and a push-out test was carried out after 2, 4, and 12 weeks. After 12 weeks, the push-out strengths of the graded film, the pure HA film and the non-coated columns were 3.7, 3.5, and 1.0 MPa.

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References

  1. 1.
    Practical New Material Association, “Practical New Material Technology Handbook” (TSC Publisher Co., Ltd. Tokyo) (1996) 123-129.Google Scholar
  2. 2.
    M. Niino and S. Maeda, J. Functional Material Tokyo, January (1990) 22-28.Google Scholar
  3. 3.
    Society of Applied Physics, “Thin Film Fabrication Handbook” (Kyoritsu Publishing Co., Ltd., Tokyo, 1991).Google Scholar
  4. 4.
    F. Watari, A. Yokoyama, F. Saso, M. Uo and T. Kawasaki, “Proceedings of the 3rd International Symposium On Structural and Functional Gradient Materials” (1995) 1-6.Google Scholar
  5. 5.
    F. Saso, A. Yokoyama, F. Watari and T. Kawasaki, Hokkaido J. Dent. Sci. 18 (1997) 85-104.Google Scholar
  6. 6.
    F. Watari, A. Yokoyama, H. Matsuno, F. Saso, M. Uo and T. Kawasaki, Mater. Sci. Forum 308-311 (1999) 356-361.Google Scholar
  7. 7.
    R. V. Stuart, “Vacuum Technology, Thin Film and Sputtering” (Academic Press Inc., New York, 1983).Google Scholar
  8. 8.
    K. De Groot, J. G. C. Wolke and J. A. Jansen, “Proceedings of the Institute of Mechanical Engineers” Part H, 212 (1998) 137-147.Google Scholar
  9. 9.
    K. Ozeki, I. Nishimura and T. Yuhta, “Proceedings of the Symposium On Precision Engineering” Tokyo (1992) 977-978.Google Scholar
  10. 10.
    H. Leiste, M. StÜber, V. Schier and H. Holleck, Mater. Sci. Forum 308-311 (1999) 467-475.Google Scholar
  11. 11.
    P. Benjamin and C. Weaver, “Proceedings of the Royal Society of London, Series A” 254 (1960) 163.Google Scholar
  12. 12.
    K. Ozeki, T. Yuhta, H. Aoki, I. Nishimura and Y. Fukui, Bio-Med. Mat. Eng. 10 (2000) 221-227.Google Scholar
  13. 13.
    K. Ozeki, T. Yuhta, H. Aoki, I. Nishimura and Y. Fukui, Bio-Med. Mat. Eng. 11 (2001) 63-68.Google Scholar
  14. 14.
    T. Li, J. Lee, T. Kobayashi and H. Aoki, J. Mater. Sci.: Mater. Med. 7 (1996) 355-357.Google Scholar

Copyright information

© Kluwer Academic Publishers 2002

Authors and Affiliations

  • Kazuhide Ozeki
    • 1
  • Toshio Yuhta
    • 1
  • Yasuhiro Fukui
    • 1
  • Hideki Aoki
    • 2
  • Ikuya Nishimura
    • 3
  1. 1.Applied Systems Engineering, Graduate School of Science and EngineeringTokyo Denki UniversityIshizaka, Hatoyama, Hiki, SaitamaJapan
  2. 2.Frontier Research and Development CenterTokyo Denki UniversityIshizaka, Hatoyama, Hiki, SaitamaJapan
  3. 3.Department of Biomedical EngineeringHokkaido UniversityKita-ku, SapporoJapan

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