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Journal of Materials Science Letters

, Volume 17, Issue 18, pp 1545–1547 | Cite as

Epitaxial Growth of Si by Low-energy DC-plasma Chemical Vapor Deposition

  • E. Mateeva
  • H. R. Deller
  • U. Kafader
  • C. Rosenblad
  • H. Von Känel
  • A. Dommann
Article

Keywords

Polymer Chemical Vapor Deposition Vapor Deposition Chemical Vapor Epitaxial Growth 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Kluwer Academic Publishers 1998

Authors and Affiliations

  • E. Mateeva
    • 1
  • H. R. Deller
    • 1
  • U. Kafader
    • 1
  • C. Rosenblad
    • 1
  • H. Von Känel
    • 1
  • A. Dommann
    • 2
  1. 1.Laboratorium für Festkörperphysik, ETH HönggerbergZürichSwitzerland
  2. 2.Neu-Technikum BuchsBuchsSwitzerland

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