Abstract
Dual-frequency aegon discharge at 100 m Torr is modeled with a 2-D fluid model in this study. The plate gap of the system is 20 mm, and discharges are modeled at High Frequency (HF) 40 MHz, 60 MHz, 80 MHz, Low Frequency (LF) 2 MHz, 5 MHz, 10 MHz, low-frequency voltage 50 V, 75 V, 100 V and high-frequency voltage 200 V, respectively. The spatial distribution of electron density and ion density and the periodic evolution of instantaneous electric potential in bulk plasma and sheath are discussed. The numerical results show that plasma density increases with HFs and LFs and LF voltage, while HFs has more effect on the density. It is concluded that improving the ratio of HFs/LFs and increasing LF voltages is a method to gain high density and high ion bombardment energy simultaneously based on the analysis of electric potential distribution.
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LIEBERMAN M. A., LICHTENBERG A. J. principles of plasma discharge and materials processing[M]. Second Edition, New Jersey: John Wiley and Sons. Inc., 2005.
KITAJIMA T., TAKEO Y. and PETROVIC Z. L. et al. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma[J]. Applied Physics Letters, 2000, 77(4): 489–491.
MAESHIGE K., WASHIO G. and YAGISAWA T. et al. Functional design of a pulsed two-frequency capacitively coupled plasma in CF4 /Ar for SiO2 etching[J]. Journal of Applied Physics, 2002, 91(12): 9494–9501.
VAHEDI V., BIRDSALL C. K. and LIEBERMAN M. A. et al. Verification of frequency scaling laws for capacitive radio-frequency discharges using two-dimensional simulations[J]. Phys. Fluids B, 1993, 5(7): 2719–2729.
HONG Y. J., KO H. S. and PARK G. Y. et al. Kinetic plasma simulations for three dielectric etchers[J]. Computer Physics Communications, 2007, 177(1-2): 122–123.
GEORGIEVA V., BOGAERTS A. and GIJBELS R. Numerical study of Ar/CF4 /N2 discharges in single- and dual-frequency capacitively coupled plasma reactors[J]. Journal of Applied Physics, 2003, 94(6): 3748–3756.
RAKHIMOVA T. V., BRAGINSKY O. V. and IVANOV V. V. et al. Experimental and theoretical study of RF plasma at low and high frequency[C]. Special Issue of the IEEE Transactions on PLasma Science. Eindhoven, The Netherlands, 2006, 34(3): 867–877.
WANG S., XU X. and SONG Y. H. et al. Frequency matching effects on characteristics of bulk plasmas and sheaths for dual-frequency capacitively coupled argon discharges: One-dimensional fluid simulation[J]. Plasma Science and Technology, 2008, 10(1): 57–60.
KOLOBOV V. I. Fokker-Planck modeling of electron kinetics in plasmas and semiconductors[J]. Computational Materials Science, 2003, 28(2): 302–320.
KOLOBOV V. I., ARSLANBEKOV R. R. Simulation of electron kinetics in gas discharges[C]. Special Issue of the IEEE Transactions on Plasma Science. Eindhoven, The Netherlands, 2006, 34(3): 895–913.
CHENG Jia, ZHU Yu and WANG Jin-song. Two-dimensional discharge simulation of inductively coupled plasma etcher[J]. Chinese Journal of Semiconductors, 2007, 28(6): 989–994(in Chinese).
AN Yi- ran, LU Yi- jia and LI Dong-San et al. Threedimensional discharge simulation of inductively coupled plasma (ICP) etching reactor[J]. Science in China Series E: Technological Sciences, 2008, 51(6): 674–682.
GOLANT V. E., ZHILINSKY A. P. and SAKHAROV I. E. Fundamentals of plasma physics[M]. New York: Wiley, 1980.
BUKOWSKI J. D., GRAVES D. B. and VITELLO P. Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles[J]. Journal of Applied Physics, 1996, 80(5): 2614–2623.
BABAEVA N. Y., KUSHNER M. J. Ion energy and angular distributions into the wafer-focus ring gap in capacitively coupled discharges[J]. Journal of Physics D: Applied Physics, 2008, 41(6): 062004.1–062004.4.
WAN De-cheng, DAI Shi-qiang and CHEN Yun-ming. Numerical simulation of interactions of particles with plasma fields in a RF plasma generator[J]. Journal of Hydrodynamics, Ser. A, 1996, 11(2): 212–220(in Chinese).
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Biography: LU Yi-jia (1981-), Male, Ph. D.
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Lu, Yj., Yan, Dq. & Chen, Ys. 2-D Fluid Simulation of Dual-Frequency Capacitively Coupled Plasma. J Hydrodyn 21, 814–819 (2009). https://doi.org/10.1016/S1001-6058(08)60217-6
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DOI: https://doi.org/10.1016/S1001-6058(08)60217-6