Skip to main content
Log in

2-D Fluid Simulation of Dual-Frequency Capacitively Coupled Plasma

  • Published:
Journal of Hydrodynamics Aims and scope Submit manuscript

Abstract

Dual-frequency aegon discharge at 100 m Torr is modeled with a 2-D fluid model in this study. The plate gap of the system is 20 mm, and discharges are modeled at High Frequency (HF) 40 MHz, 60 MHz, 80 MHz, Low Frequency (LF) 2 MHz, 5 MHz, 10 MHz, low-frequency voltage 50 V, 75 V, 100 V and high-frequency voltage 200 V, respectively. The spatial distribution of electron density and ion density and the periodic evolution of instantaneous electric potential in bulk plasma and sheath are discussed. The numerical results show that plasma density increases with HFs and LFs and LF voltage, while HFs has more effect on the density. It is concluded that improving the ratio of HFs/LFs and increasing LF voltages is a method to gain high density and high ion bombardment energy simultaneously based on the analysis of electric potential distribution.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. LIEBERMAN M. A., LICHTENBERG A. J. principles of plasma discharge and materials processing[M]. Second Edition, New Jersey: John Wiley and Sons. Inc., 2005.

    Book  Google Scholar 

  2. KITAJIMA T., TAKEO Y. and PETROVIC Z. L. et al. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma[J]. Applied Physics Letters, 2000, 77(4): 489–491.

    Article  Google Scholar 

  3. MAESHIGE K., WASHIO G. and YAGISAWA T. et al. Functional design of a pulsed two-frequency capacitively coupled plasma in CF4 /Ar for SiO2 etching[J]. Journal of Applied Physics, 2002, 91(12): 9494–9501.

    Article  Google Scholar 

  4. VAHEDI V., BIRDSALL C. K. and LIEBERMAN M. A. et al. Verification of frequency scaling laws for capacitive radio-frequency discharges using two-dimensional simulations[J]. Phys. Fluids B, 1993, 5(7): 2719–2729.

    Article  Google Scholar 

  5. HONG Y. J., KO H. S. and PARK G. Y. et al. Kinetic plasma simulations for three dielectric etchers[J]. Computer Physics Communications, 2007, 177(1-2): 122–123.

    Google Scholar 

  6. GEORGIEVA V., BOGAERTS A. and GIJBELS R. Numerical study of Ar/CF4 /N2 discharges in single- and dual-frequency capacitively coupled plasma reactors[J]. Journal of Applied Physics, 2003, 94(6): 3748–3756.

    Article  Google Scholar 

  7. RAKHIMOVA T. V., BRAGINSKY O. V. and IVANOV V. V. et al. Experimental and theoretical study of RF plasma at low and high frequency[C]. Special Issue of the IEEE Transactions on PLasma Science. Eindhoven, The Netherlands, 2006, 34(3): 867–877.

    Article  Google Scholar 

  8. WANG S., XU X. and SONG Y. H. et al. Frequency matching effects on characteristics of bulk plasmas and sheaths for dual-frequency capacitively coupled argon discharges: One-dimensional fluid simulation[J]. Plasma Science and Technology, 2008, 10(1): 57–60.

    Article  Google Scholar 

  9. KOLOBOV V. I. Fokker-Planck modeling of electron kinetics in plasmas and semiconductors[J]. Computational Materials Science, 2003, 28(2): 302–320.

    Article  Google Scholar 

  10. KOLOBOV V. I., ARSLANBEKOV R. R. Simulation of electron kinetics in gas discharges[C]. Special Issue of the IEEE Transactions on Plasma Science. Eindhoven, The Netherlands, 2006, 34(3): 895–913.

    Article  Google Scholar 

  11. CHENG Jia, ZHU Yu and WANG Jin-song. Two-dimensional discharge simulation of inductively coupled plasma etcher[J]. Chinese Journal of Semiconductors, 2007, 28(6): 989–994(in Chinese).

    Google Scholar 

  12. AN Yi- ran, LU Yi- jia and LI Dong-San et al. Threedimensional discharge simulation of inductively coupled plasma (ICP) etching reactor[J]. Science in China Series E: Technological Sciences, 2008, 51(6): 674–682.

    Article  Google Scholar 

  13. GOLANT V. E., ZHILINSKY A. P. and SAKHAROV I. E. Fundamentals of plasma physics[M]. New York: Wiley, 1980.

    Google Scholar 

  14. BUKOWSKI J. D., GRAVES D. B. and VITELLO P. Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles[J]. Journal of Applied Physics, 1996, 80(5): 2614–2623.

    Article  Google Scholar 

  15. BABAEVA N. Y., KUSHNER M. J. Ion energy and angular distributions into the wafer-focus ring gap in capacitively coupled discharges[J]. Journal of Physics D: Applied Physics, 2008, 41(6): 062004.1–062004.4.

    Article  Google Scholar 

  16. WAN De-cheng, DAI Shi-qiang and CHEN Yun-ming. Numerical simulation of interactions of particles with plasma fields in a RF plasma generator[J]. Journal of Hydrodynamics, Ser. A, 1996, 11(2): 212–220(in Chinese).

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Yi-jia Lu.

Additional information

Biography: LU Yi-jia (1981-), Male, Ph. D.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lu, Yj., Yan, Dq. & Chen, Ys. 2-D Fluid Simulation of Dual-Frequency Capacitively Coupled Plasma. J Hydrodyn 21, 814–819 (2009). https://doi.org/10.1016/S1001-6058(08)60217-6

Download citation

  • Received:

  • Revised:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1016/S1001-6058(08)60217-6

Key words

Navigation