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1 Correction to: Nanomanufacturing and Metrology (2022) 5:91–100 https://doi.org/10.1007/s41871-022-00124-y
The original version of this article unfortunately contained a mistake. The following declaration text was missing.
Gaoliang Dai is an editorial board member for “Nanomanfucturing and Metrology” and was not involved in the editorial review, or the decision to publish this article. All authors declare that there are no competing interests.
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Dai, G., Hahm, K., Sebastian, L. et al. Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM. Nanomanuf Metrol 5, 440 (2022). https://doi.org/10.1007/s41871-022-00165-3
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DOI: https://doi.org/10.1007/s41871-022-00165-3