Abstract
In this paper, we analyze mass transfer during growth of epitaxial layers in magnetrons. Due to analysis of influence of physical and technological parameters on the growth, we formulate several recommendations to improve properties of epitaxial layers: increasing of homogeneity of films; decreasing of quantities of defects of films; dependence of properties of heterostructure on geometric dimensions of magnetron (in fact this is correlation between the above geometric dimensions and growth time). We introduce an analytical approach for analyzing mass transfer. The approach gives a possibility to take into account the nonlinearity of processes, as well as changes in parameters in space and time. The approach also gives a possibility to analyze the mass transfer without crosslinking of solutions on interfaces between layers of multilayer structures.
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Pankratov, E.L. On estimation of growth velocity of films during magnetron sputtering. ISSS J Micro Smart Syst 12, 133–138 (2023). https://doi.org/10.1007/s41683-023-00119-x
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DOI: https://doi.org/10.1007/s41683-023-00119-x