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A compact electron storage ring for lithographical applications

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Abstract

The physical design for a novel low-energy compact-storage-ring-based extreme ultraviolet (EUV) light source was systemically studied. The design process considers the linear and nonlinear beam optics, including transverse matching and the optimization of the dynamic aperture, momentum aperture, and beam lifetime. With a total circumference of 36.7 m and a beam energy of 400 MeV, the storage ring can operate with an average beam current of up to 1 A. With the undulator as the radiator, this facility has the potential to emit EUV radiation at 13.5 nm with an average power exceeding 10 W within the bandwidth. In addition, the collective instabilities of the lattice at high beam current were analyzed; it was found that the typical instabilities which may occur in an electron storage ring can be reasonably controlled in our design. With the advantages of variable beam energy and current, this design exhibits great promise as a new candidate for various EUV lithographical applications requiring tunable radiation power.

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Acknowledgements

The authors would like to thank Dr. Bo-Cheng Jiang for useful discussions on storage ring physics, Dr. Zhen Wang for assistance with SPECTRA, Dr. Chao Feng for advice on the undulator, Dr. Xiao-Xia Huang for assistance with the impedance calculation, Dr. Yi-Yong Liu for the vacuum pipe calculation, and Dr. Wei Zhang for advice on the magnets.

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Authors and Affiliations

  1. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China

    Si-Qi Shen & Zhen-Tang Zhao

  2. University of Chinese Academy of Sciences, Beijing, 100049, China

    Si-Qi Shen & Zhen-Tang Zhao

  3. Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China

    Da-Zhang Huang, Zhen-Tang Zhao & Qing-Lei Zhang

Authors
  1. Si-Qi Shen
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  2. Da-Zhang Huang
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  3. Zhen-Tang Zhao
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  4. Qing-Lei Zhang
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Contributions

All authors contributed to the study conception and design. Material preparation, data collection, and analysis were performed by Si-Qi Shen, Da-Zhang Huang, and Zhen-Tang Zhao. The first draft of the manuscript was written by Si-Qi Shen, and all authors commented on subsequent versions of the manuscript. All authors read and approved the final manuscript.

Corresponding author

Correspondence to Da-Zhang Huang.

Additional information

This work was supported by the National Key Research and Development Program of China (No. 2016YFA0401901) and the National Natural Science Foundation of China (No. 11675248).

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Shen, SQ., Huang, DZ., Zhao, ZT. et al. A compact electron storage ring for lithographical applications. NUCL SCI TECH 32, 91 (2021). https://doi.org/10.1007/s41365-021-00924-9

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